Wavefront sensing of
►EUVL plasma sources
►Free Electron Lasers
In contrast to the spectra range above 150nm, there are no transmissive optical materials available in the EUV/XUV-spectral range. In order to measure wavefronts in this case the microlens array (Hartmann-Shack) is replaced by a pinhole array (Hartmann plate).
The Hartmann wavefront sensor can be used for both coherent and incoherent radiation. It is compact, self-supproting and achromatic due to the lack of dispersive optical elements. With this EUV/XUV wavefront sensor actinic characterization and real-time optics adjustment of EUVL plasma sources, Free Electron Lasers, and HHG beams can be carried out.
In the EUV (λ = 13.5 nm) the single-pulse repeatability is λ/116 (wrms).
Field of view
x/y translation range
< 1 nm … 60 nm (quantum converter)
9.0mm x 6.7 mm (larger on request)
precision pinholes Ø75µm, 250µm pitch
mounted on CF63 flange